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Prof. Sasangan Ramanathan

Dean

Prof. Sasangan Ramanathan
Dean,
Faculty of Engineering

Qualification: Ph.D
sasangan@amrita.edu
Ph: +91-7598155285

Bio

Prof. Sasangan Ramanathan, Dean- Engineering and a Professor in the Department of Chemical Engineering and Materials Science, brings with him over 20 years of international research, management and leadership experience. Prof. Sasangan’s focus and dedication is in preparing the next generation graduates for challenges in science, engineering, technology and management. He represents the university’s commitment to excellence in teaching, learning, research and positive contribution to the society. He is a strong believer in an educational process that promotes creativity, innovation and entrepreneurship while providing the students with strong fundamentals. Prof. Sasangan Ramanathan holds a Ph. D. in Chemical Engineering from Clarkson University (USA), has served in various capacities in research and development in the US. Recently, he served as the Chief Technology Officer for a multi-million dollar company in the US in developing cutting edge technology for advanced semiconductor device fabrication.

He is well recognized by leading semiconductor device manufacturers like Samsung, SK Hynix, Fujitsu and Toshiba (to name a few). He has been an active member in defining the semiconductor technology roadmap, driving new product development,Besides an illustrious career in the semiconductor industry, Prof. Sasangan was also involved in developing novel catalytic materials aimed at reducing the emission of ozone depleting toxic gases. In addition to being an active researcher, he joined Amrita with strong leadership skills and management experience, leading strategic business development,managing alliances/collaborations with key industry partners/consortia & universities across the globe. Prof. Sasangan has a strong passion for innovation and creativity.

He has authored/co-authored over 45 publications in international journals  and conferences and holds 12 patents. He also served on the International Technical Advisory committee in the American Vacuum Society’s topical conference on Atomic Layer Deposition. He is also an active participant and member of the advisory committee of topical conferences in Electrochemical Society and American Chemical Society and has chaired a number of international conference sessions.

Education

YEAR DEGREE/PROGRAM INSTITUTION
1995 PhD in Chemical Engineering Clarkson University, Potsdam, NY 13676 USA
1991 Postgraduate Degree Clarkson University, Potsdam, NY 136786 USA
1989 Undergraduate Degree National Institute of Technology, Trichy, India

Work Experience

Year Affiliation
April 2014 – Present Dean, Faculty of Engineering, Amrita Vishwa Vidyapeetham
Professor, Department of Chemical Engineering and Materials Science, School of Engineering, Amrita Vishwa Vidyapeetham
2008 – 2014 Chief Technology Officer, AIXTRON, Inc., Sunnyvale, CA USA
2004 – 2008 Vice President, Business Development & Technology, Genus, Inc. USA
2001 – 2004 Director, Technology, Genus, Inc. USA
1999 – 2001 Manager, Process Development, Novellus Systems, Inc. USA
1995 – 1999 Sr. Process Development Engineer, Quester Technology, Inc. USA

Research & Management Experience

  • Has been a significant contributor in defining the technology roadmap for semiconductor capital equipment manufacturers, specifically thin film deposition equipment
  • Demonstrated leadership in product development with special focus in transferring technology & concepts to products
  • Possesses strong fundamental understanding of various thin film deposition techniques – physical vapour deposition, chemical vapour deposition and atomic layer deposition
  • Has initiated and led several industry and academic collaborations to promote advanced semiconductor chip manufacturing
  • Been a significant contributor in various managerial roles spanning from technology and business development, strategic business planning, merger & acquisition and industry-academia partnership
  • Besides the contribution in semiconductor chip manufacturing expert, an excellent materials scientist with significant contribution in developing novel catalyst for shale oil refining, which has led to a boom in the shale oil refining in the US

Major Research Interests

  • Deposition and characterization of materials for advanced CMOS process technology (14nm and beyond)
  • Surface Science and Catalysis
  • Advanced deposition technologies such as Atomic Layer Deposition to “tailor the material properties” for various applications

Sponsored Projects (Submitted)

Investigation on High Performance Nano Adhesive Bonding of Ultra High Temperature Resistant Polymer and its Performance under Space Environments

Peer Reviewed International Journals (Under Review)

  1. A.V. Akhil, D. D Raj, M.K. Raj, S.R Bhat, V.Akshay, S.Bhomwik and S. Ramanathan., Effect of Low Pressure Plasma and Ultra Violet Radiation on Vaporized Solvent Bonding of Transparent Polymer, submitted to Journal of Polymer Engineering and Science IF 1.42.
  2. S. Sharma, A. Maalavan, A. Nivetha, K. Sivasubramanian, S. Sreekumar, S. Bhowmik, S. Ramanathan, R. Rane and S. Mukherjee, Electrical Conductive Coating on polymeric composites to prevent lightening strike damage on aircraft, submitted to Journal of Composites A IF 2.6.

Membership in Professional Bodies

  1. American Vacuum Society
  2. American Chemical Society
  3. Electrochemical Society

Student Guidance

Doctoral Students

  1. Development of Ulta High Temperature Resistance Polymeric Nanocomposites for Long Distance Space Applications”(Mr.P.Mohankumar)-Ongoing – Co-Supervisor
  2. “Development of Metal/Poly Ether Ether Ketone Hybrid Composite Laminates for Nuclear Waste Storage Containers” (Mr. Manu Remanan)-Ongoing– Co-Supervisor
Publications

Book Chapter

Conference Paper

Advances in ALD GST Process and Equipment for sub-20nm PCRAM Devices: Precursor delivery, GST Gapfill and Electrical Characterization

Authors : Prof. Sasangan Ramanathan, Z. Karim, Yang, L., Mack, J., Liu, M., Weber, U., Baumann, P., Lu, B., Czubatyj, W., Hudgens, S.

Publisher : Conference Proceedings by the Society for Solid State and Electrochemical Science and Technology

Atomic Level Solutions for Advanced Microelectronic Applications

Authors : Prof. Sasangan Ramanathan, Y. Senzaki

Publisher : International Conference on Solid State and Integrated Circuit Technology, ICSICT 2008.

Conference Proceedings

Material and Tool Design Challenges for Taking ALD to High Volume Production Beyond 30nm Node

Authors : Prof. Sasangan Ramanathan, Lu, B, Karim, Z.

Publisher : Symposium on Manufacturing and Technology Section MS2, American Vacuum Society

Atomic Layer Deposition of Smooth Phase Change GexSbyTez Layers on Planar and 3D Structures

Authors : Prof. Sasangan Ramanathan, L. Yang, Weber, U., Baumann, P. K., Mack, J., Karim, Z., Lu, B.

Publisher : International Conference on Atomic Layer Deposition, American Vacuum Society

Deposition and Electrical Characterization of ALD GexSbyTez for Future Applications

Authors : Prof. Sasangan Ramanathan, Yang, L., Weber, U., Maumann, P. K., Karim, Z, Lu, B., Czubatyj, W, Hudgens, S., Lowrey, T

Publisher : 12th International Conference on Atomic Layer Deposition, American Vacuum Society

Atomic Layer Deposition of Materials for Alternate Non-Volatile Memory Technologies

Authors : Prof. Sasangan Ramanathan

Publisher : Invited Talk at the 13th Atomic Layer Deposition Conference, American Vacuum Society

Modulating Work Function for pFET with AVD Ru-based and TaN-based Gate Electrodes

Authors : Prof. Sasangan Ramanathan, C. Choi, Ando, T., Karim, Z.

Publisher : 39th IEEE Semiconductor Interface Specialist Conference

Atomic Vapor Deposition for Next Generation of Advanced Semiconductor Devices

Authors : Prof. Sasangan Ramanathan, M. Schumacher; P. K. Baumann; J. Linder; C. Lohe; U. Weber; Z. Karim; A. R. Londergan; T. E. Seidel

Pathways in Competitiveness for Atomic Layer Deposition

Authors : Prof. Sasangan Ramanathan, Tom Seidel; Ana Londergan; Eddie Lee; Adrian Jansz

Advances in ALD Equipment for sub-40nm Memory Capacitor Dielectrics: Precursor delivery, Materials and Processes

Authors : Prof. Sasangan Ramanathan, Karim, Zia; Senzaki, Yoshi; Lindner, Johannes; Silva, Hugo; Dauelsberg, Martin

Publisher : ECS Transactions

Mass Production Worthy HfO2-Al2O3 Laminates Capacitor Technology using Hf Liquid Precursor for sub-100 nm DRAMS

Authors : Prof. Sasangan Ramanathan, J. H. Lee, J., K., S., K. Y., S., J. H., Lee, N. I., Kang, H. K., Suh, K. P., Jeong, M. M., Hyun, K., Baik, H. S., Chung, Y. S., Liu, X., Seidel, T. E., Winkler, J., Londergan, A., Kim, H. Y., M., J., and Lee, N. K.

Publisher : Techincal Digest, International Electron Devices Meeting

PATHWAYS FOR ADVANCED TRANSISTORS USING HAFNIUM–BASED OXIDES BY ATOMIC LAYER DEPOSITION

Authors : Prof. Sasangan Ramanathan, A. R. Londergan, Winkler, J., Seidel, T. E., Gutt, J., Brown, G., and Murto, R. W.

Publisher : Electrochemical Society

Needs for Next Generation Memory and Enabling Solutions based on Advanced Vaporizer Technology

Authors : Prof. Sasangan Ramanathan, Z. Karim, Senzaki, Y., . Y Kim, G., Barelli, C., Okuyama, Y., Kim, H. Y., Lu, B., Lindner, J.

Publisher : 9th Atomic Layer Deposition Conference, American Vacuum Society

Highly Conformal ALD of LaOx and La-based High-k Dielectric Films Using Novel Vaporizer Technology

Authors : Prof. Sasangan Ramanathan, C. Barelli, . Y Kim, H., . Y Kim, G., Senzaki, Y., Okuyama, Y., Mack, J., Lindner, J., Lu, B., Karim, Z.

Publisher : Materials Research Society Spring Meeting

A High Deposition Rate Process Using Limited Optimized Reaction ALD”, Atomic Layer Deposition Conference

Authors : Prof. Sasangan Ramanathan, Kim G. Y., Srivastava A., D., F., A., L., Z., K., Seidel T. E.

Publisher : Atomic Layer Deposition Conference, American Vacuum Society

Development of Next Generation High-k Filmss – Challenges and Solutions

Authors : Prof. Sasangan Ramanathan

Publisher : European Materials Research Society Spring Meeting

Evaluation od ALD Hafnium Silicate and Improvement of Reliability Characteristics

Authors : Prof. Sasangan Ramanathan, H. J. Lim, Kim, Y. S., Jung, H. S., Han, S. K., Kim, M. J., Lee, J. H., Lee, N. I., Chung, Y., Kim, H. Y., Lee, N. K., Seidel, T. E., and Boleslawski, M.

Publisher : Atomic Layer Deposition Conference

Void Free Gapfill and Phase Change Memory Device Characterization of GeSbTe Films Deposited Using Atomic Vapor Deposition

Authors : Prof. Sasangan Ramanathan, P. Lehnen, Weber, U., Baumann, P. K., Senzaki, Y., Karim, Z., Dr. Sasangan Ramanathan, Lu, B., Reed, J., Czubatyj, W., Hudgens, S., and Dennison, C.

Publisher : 10th Atomic Layer Deposition Conference, American Vacuum Society

Journal Article

Structural, Surface, and Catalytic Properties of a New Bimetallic V-Mo Oxynitride Catalyst for Hydrodenitrogenation

Authors : Prof. Sasangan Ramanathan, C. Charles Yu,Fawzy Sherif,S. Ted Oyama

Publisher : The Journal of Physical Chemistry

New Catalysts for Hydroprocessing: Transition Metal Carbides and Nitrides

Authors : Prof. Sasangan Ramanathan, S. T. Oyama

Publisher : The Journal of Physical Chemistry

Bimetallic Nb−Mo Carbide Hydroprocessing Catalysts:  Synthesis, Characterization, and Activity Studies

Authors : Prof. Sasangan Ramanathan, C. Charles Yu; B. Dhandapani; J. G. Chen; S. Ted Oyama

Publisher : The Journal of Physical Chemistry B

Synthesis, Characterization, and Reactivity Studies of Supported Mo2C with Phosphorus Additive

Authors : Prof. Sasangan Ramanathan, B. Dhandapani; C.C. Yu; B. Frühberger; J.G. Chen; S.T. Oyama

Publisher : Journal of Catalysis

Progress and Opportunities in Atomic Layer Deposition

Authors : Prof. Sasangan Ramanathan, Tom Seidel, Londergan, A., Winkler, J., Liu, X.

EnergyGap and Band Alignment for (HfO2)x(Al2O3)1−x(HfO2)x(Al2O3)1−x on (100) Si

Authors : Prof. Sasangan Ramanathan, H. Y. Yu, M. F. Li; Byung Jin Cho; C. C. Yeo; M. S. Joo; D-L. Kwong; J. S. Pan; C. H. Ang; J. Z. Zheng

Thermal Stability of (HfO2)x(Al2O3)1−x on Si

Authors : Prof. Sasangan Ramanathan, Yu,H. Y.; Wu,N.; Li,M. F.; Chunxiang Zhu; Byung Jin Cho; Kwong,D.-L.; Tung,C. H.; Pan,J. S.; Chai,J. W.; Wang,W. D.; Chi,D. Z.; Ang,C. H.; Zheng,J. Z.;

Stresses in Sputtered RuOx Thin Films

Authors : Prof. Sasangan Ramanathan, S.B. Desu; D.P. Vijay ; H.D. Bhatt; S. Tirumala

Process Optimization in Atomic Layer Deposition of High-K Oxides for Advanced gate Stack Engineering

Authors : Prof. Sasangan Ramanathan, A. R. Londergan, Vu, K., Rassiga, S., Hiznay, R., Winkler, J., Velasco, H., Matthysse, L., Seidel, T. E., Ang, C. H.

Publisher : Rapid Thermal and Other Short-Time Technologies III, ECS, Pennington

Highly Conformal ALD of ZrO2 at Higher Process Temperatures than the Conventinal TEMAZr-Based Process

Authors : Prof. Sasangan Ramanathan, Senzaki, Yoshi; Okuyama, Yoshi; Kim, Gi; Kim, Hae Young; Barelli, Carl; Lindner, Johannes; Karim, Zia;

Publisher : ECS Transactions

ALD of Hafnium Oxide Thin Films from Tetrakis (ethylmethylamino) Hafnium and Ozone

Authors : Prof. Sasangan Ramanathan, Liu, Xinye; Longdergan, Ana; Srivastava, Anuranjan; Lee, Eddie; Seidel, Thomas E; Barton, Jeffrey T; Pang, Dawen; Gordon, Roy G

Publisher : Journal of The Electrochemical Society

Advanced Metal Gate Electrode Options Compatible with ALD and AVD® HfSiOx-based Gate Dielectrics

Authors : Prof. Sasangan Ramanathan, Karim, Zia; Biossiere, Olivier; Lohe, Christoph; Zhang, Zhihong; Park, Woong; Manke, Christian; Baumann, Peter K; Dalton, Jeremie; Lindner, Johannes; others

Publisher : ECS Transactions

High Performance ALD Reactor for High-k Films

Authors : Prof. Sasangan Ramanathan, Dalton, Jeremie; Kim, Hae Young; Zhang, Zhihong; Seidel, Tom; Karim, Zia;

Publisher : ECS Transactions

Patents

Method for forming TiSiN thin film layer by using atomic layer deposition

Authors : Prof. Sasangan Ramanathan, W. PARK, Jang, Y. J., Kim, G. Y., Lu, B., Siu, G., Silva H

Transient Enhanced Atomic layer Deposition

Authors : Prof. Sasangan Ramanathan, Kim G. Y, Srivastava A, Seidel T. E, Londergan A. R

Flash Evaporator

Authors : Prof. Sasangan Ramanathan, Desu S. B., Suchicital C.A.

Ferroelectric Thin Film Composites made by Metalorganic Decomposition

Authors : Prof. Sasangan Ramanathan, Sengupta, S.; Stowell, S.; Sengupta, L.; Joshi, P.C.; Desu, S.B.

Transient Enhanced Atomic layer Deposition (Granted)

Authors : Prof. Sasangan Ramanathan, Kim G. Y.; Srivastava A.; Seidel T. E.; Londergan A. R.;

Flash Evaporator (Granted)

Authors : Prof. Sasangan Ramanathan, Desu S. B.; Suchicital C.A.

Ferroelectric Thin Film Composites made by Metalorganic Decomposition (Granted)

Authors : Prof. Sasangan Ramanathan, Sengupta, S.; Stowell, S.; Sengupta, L.; Joshi, P.C.; Desu, S.B.

Multi-single Wafer Processing Apparatus

Authors : Prof. Sasangan Ramanathan, Puchacz, J, Reyes, M.,Seidel, T.

Student Guidance

Doctoral Students

  1. “Development of Ulta High Temperature Resistance Polymeric Nanocomposites for Long Distance Space Applications”(Mr.P.Mohankumar)-Ongoing – Co-Supervisor
  2. “Development of Metal/Poly Ether Ether Ketone Hybrid Composite Laminates for Nuclear Waste Storage Containers” (Mr. Manu Remanan)-Ongoing– Co-Supervisor
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