Back close

Passivation Method for Improved Uniformity and Repeatability for Atomic Layer Deposition and Chemical Vapor Deposition (Granted)

Publication Type : Patents

Source : Number 6720259, US 10/262,992, USA (2004)

Url : https://www.google.com/patents/US6720259

Campus : Coimbatore

School : School of Engineering

Department : Chemical

Verified : Yes

Year : 2004

Abstract : A method to deposit a passivating layer of a first material on an interior reactor surface of a cold or warm wall reactor, in which the first material is non-reactive with one or more precursor used to form a second materials. Subsequently when a film layer is deposited on a substrate by subjecting the substrate to the one or more precursors, in which at least one precursor has a low vapor pressure, uniformity and repeatability is improved by the passivation layer.

Cite this Research Publication : A. R. Londergan, Dr. Sasangan Ramanathan, Winkler, J., and Seidel, T. E., “Passivation Method for Improved Uniformity and Repeatability for Atomic Layer Deposition and Chemical Vapor Deposition (Granted)”, U.S. Patent 6720259, US 10/262,9922004.

Admissions Apply Now