Publication Type : Conference Paper
Publisher : 32nd IEEE Semiconductor Interface Specialist Conference, Washington DC
Source : 32nd IEEE Semiconductor Interface Specialist Conference, Washington DC (2001)
Campus : Amritapuri
School : School of Engineering
Department : Electronics and Communication
Year : 2001
Abstract :
Cite this Research Publication : Dr. Sundararaman Gopalan, Dharmarajan, E., Nieh, R., Onishi, K., Kang, C. S., Choi, R., Cho, H., and Lee, J. C., “Ultrathin Hafnium Silicate Films with TaN and Polysilicon Gate Electrodes for Gate Dielectric Application”, in 32nd IEEE Semiconductor Interface Specialist Conference, Washington DC, 2001.