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Ultrathin Gate Oxynitrides Grown Using Fast Ramp Vertical Furnace for Sub-130 Nanometer Technology

Publication Type : Journal Article

Publisher : Electrochemical and Solid-State Letters

Authors : Dr. Sundararaman Gopalan, A. Lucas, Lee, J. C., Kaushal, S., Niino, R., and Tada, Y.

Source : Electrochemical and Solid-State Letters, vol. 3, pp. 389–391, 2000.

Campus : Amritapuri

School : School of Engineering

Department : Electronics and Communication

Year : 2000

Abstract :

Cite this Research Publication :
A. Lucas, Dr. Sundararaman Gopalan, Lee, J. C., Kaushal, S., Niino, R., and Tada, Y., “Ultrathin Gate Oxynitrides Grown Using Fast Ramp Vertical Furnace for Sub-130 Nanometer Technology”, Electrochemical and Solid-State Letters, vol. 3, pp. 389–391, 2000.

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