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Publication Type : Journal Article
Publisher : High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
Source : High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, vol. 20, pp. 241–250, 2016.
Campus : Coimbatore
School : School of Engineering
Department : Mechanical Engineering
Year : 2016
Abstract : This paper reports characterization and evaluation of the mechanical properties of a titanium (Ti) film deposited on AA6061 substrate using the DC magnetron sputtering technique. The surface morphology of the Ti film was determined using scanning electron microscopy (SEM). The presence of metallic Ti was confirmed by energy-dispersive x-ray (EDX) analysis. An increase in the Ti thin film thickness from 15 μm to 26 μm on the substrate exhibits significant improvement in hardness, scratch resistance, superior adhesion, and excellent surface roughness.
Cite this Research Publication : Dr. M. Ramu, S. Venkatesan, and M. Yuvaraja, “Characterization and evaluation of the mechanical properties of a sputtered Ti thin film on AA6061 substrate”, High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, vol. 20, pp. 241–250, 2016.