Back close
Admissions

Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

Start Date: Saturday, Oct 01,2016

End Date: Saturday, Dec 31,2016

School: School of Engineering

Funded by:Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP)
Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

The Project entitled “Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching” is funded by Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP).

Duration: 2016

Host Institute: CeNSE, Indian Institute of Science Bangalore, India

Status: Completed

Related Projects

IoT Framework for Modeling, Monitoring and Damage Detection of Natural and Historical Heritage Structures
IoT Framework for Modeling, Monitoring and Damage Detection of Natural and Historical Heritage Structures
New and Efficient Photosensitizers for Nanocrystalline TiO2 Based Dye Sensitized Solar Cells
New and Efficient Photosensitizers for Nanocrystalline TiO2 Based Dye Sensitized Solar Cells
A Robust Approach for Improving the Accuracy of IMU based Indoor Mobile Robot Localization
A Robust Approach for Improving the Accuracy of IMU based Indoor Mobile Robot Localization
Design and development of a scalable laboratory model of a decentralized  Battery Pack Management System
Design and development of a scalable laboratory model of a decentralized  Battery Pack Management System
Mechanical Engineering Virtual Labs
Mechanical Engineering Virtual Labs
Admissions Apply Now