Back close

Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

Start Date: Saturday, Oct 01,2016

End Date: Saturday, Dec 31,2016

School: School of Engineering

Funded by:Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP)
Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

The Project entitled “Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching” is funded by Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP).

Duration: 2016

Host Institute: CeNSE, Indian Institute of Science Bangalore, India

Status: Completed

Related Projects

Formula SAE
Formula SAE
Design and Control of Myo-Electric Prosthetic Arm
Design and Control of Myo-Electric Prosthetic Arm
Development of an On-board Integrated Switched Reluctance Motor (SRM) traction drive for Electric Vehicles (EVs)
Development of an On-board Integrated Switched Reluctance Motor (SRM) traction drive for Electric Vehicles (EVs)
WINSOC – Wireless Sensor Networks with Self-Organization Capabilities for Critical and Emergency Applications
WINSOC – Wireless Sensor Networks with Self-Organization Capabilities for Critical and Emergency Applications
Intelligent, Animal Attack Prevention System for Crop Protection
Intelligent, Animal Attack Prevention System for Crop Protection
Admissions Apply Now