Back close

Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

Start Date: Saturday, Oct 01,2016

End Date: Saturday, Dec 31,2016

School: School of Engineering

Funded by:Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP)
Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

The Project entitled “Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching” is funded by Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP).

Duration: 2016

Host Institute: CeNSE, Indian Institute of Science Bangalore, India

Status: Completed

Related Projects

Autonomous Floor Cleaning Robot
Autonomous Floor Cleaning Robot
Smart Handheld Device for Detection of Gas Poisoning in Sewage Works
Smart Handheld Device for Detection of Gas Poisoning in Sewage Works
Detailed computational modelling and optimization of natural draught cook stoves.
Detailed computational modelling and optimization of natural draught cook stoves.
IoT Based Crop Protection System
IoT Based Crop Protection System
E-Content for Skill Development and Education
E-Content for Skill Development and Education
Admissions Apply Now