Syllabus
Unit I
Thin-films deposition by vacuum and non-vacuum processes (18 lectures)
Vacuum science and technology, physical vapour deposition: process and systems, thermal evaporation, electron beam evaporation, sputtering (DC, RF magnetron) chemical vapour deposition, film formation and nanostructure, characterization of thin films.
Unit II
Advanced micro and nanofabrication techniques (12 lectures)
Micro- and nanofabrication overview, Photolithography, e-beam lithography. Modern fabrication technologies: nano-imprint lithography, soft lithography, microfluidic applications and devices.
Unit III
Device fabrication and advanced processing methods (15 lectures)
Fabrication of 0 to 2-D nanostructures, Transistors and electronic building blocks, MEMS/NEMS, Applications of nanofabrication. Additive manufacturing and variants of 3D printing (electrochemical, laser sintering, jet fusion…).
Objectives and Outcomes
Pre-requisites: Basic math, physics and chemistry
Total number of classes: 45
Course Outcomes:
- Introduced to vacuum techniques (how to create and measure vacuum).
- Deeper understanding of physical vapour deposition techniques.
- Fundamental exposure of chemical vapour deposition.
- Theoretical understanding of advances in nanofabrication techniques
- Explore nanomaterials based device fabrication techniques and advanced manufacturing processes.