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Characterization and evaluation of the mechanical properties of a sputtered Ti thin film on AA6061 substrate

Publication Type : Journal Article

Publisher : High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Source : High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, vol. 20, pp. 241–250, 2016.

Campus : Coimbatore

School : School of Engineering

Department : Mechanical Engineering

Year : 2016

Abstract : This paper reports characterization and evaluation of the mechanical properties of a titanium (Ti) film deposited on AA6061 substrate using the DC magnetron sputtering technique. The surface morphology of the Ti film was determined using scanning electron microscopy (SEM). The presence of metallic Ti was confirmed by energy-dispersive x-ray (EDX) analysis. An increase in the Ti thin film thickness from 15 μm to 26 μm on the substrate exhibits significant improvement in hardness, scratch resistance, superior adhesion, and excellent surface roughness.

Cite this Research Publication : Dr. M. Ramu, S. Venkatesan, and M. Yuvaraja, “Characterization and evaluation of the mechanical properties of a sputtered Ti thin film on AA6061 substrate”, High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, vol. 20, pp. 241–250, 2016.

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