Publication Type : Conference Paper
Publisher : The Electrochemical Society
Source : Rapid Thermal and Other Short-time Processing Technologies II: Proceedings of the International Symposium, The Electrochemical Society (2001)
Campus : Amritapuri
School : School of Engineering
Department : Electronics and Communication
Year : 2001
Abstract :
Cite this Research Publication : R. Nieh, Onishi, K., Choi, R., Dharmarajan, E., Dr. Sundararaman Gopalan, Kang, C. S., and Lee, J. C., “HIGH-K GATE DIELECTRICS: Hf02, ZK> 2, AND THEIR SILICATES”, in Rapid Thermal and Other Short-time Processing Technologies II: Proceedings of the International Symposium, 2001.