Publication Type : Journal Article
Publisher : Springer
Source : Applied Nanoscience, Springer, Volume 2, Number 1, p.1–6 (2012)
Campus : Amritapuri
School : School of Engineering
Department : Electronics and Communication
Year : 2012
Abstract :
Cite this Research Publication : S. Dutta, Ramesh, S., Shankar, B., and Dr. Sundararaman Gopalan, “Effect of PVD process parameters on the quality and reliability of thin (10–30 nm) Al2O3 dielectrics”, Applied Nanoscience, vol. 2, pp. 1–6, 2012.