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Atomic Vapor Deposition for Next Generation of Advanced Semiconductor Devices

Publication Type : Conference Proceedings

Publisher : The Electrochemical Society, Meeting Abstracts

Source : The Electrochemical Society, Meeting Abstracts, Volume 12, p.487 (2006)

Campus : Coimbatore

School : School of Engineering

Department : Chemical

Verified : Yes

Year : 2006

Abstract :

Cite this Research Publication : M. Schumacher, Dr. Sasangan Ramanathan, Baumann, P. K., J. Linder, Lohe, C., Weber, U., Karim, Z., Londergan, A. R., and Seidel, T. E., “Atomic Vapor Deposition for Next Generation of Advanced Semiconductor Devices”, The Electrochemical Society, Meeting Abstracts, vol. 12. p. 487, 2006.

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