Publication Type : Conference Proceedings
Publisher : Atomic Layer Deposition Conference, American Vacuum Society
Source : Atomic Layer Deposition Conference, American Vacuum Society, p.1308-1311 (2004)
Campus : Coimbatore
School : School of Engineering
Department : Chemical
Year : 2004
Abstract :
Cite this Research Publication : Kim G. Y., Srivastava A., Foote D., Londergan A., Karim Z., Seidel T. E., and Dr. Sasangan Ramanathan, “A High Deposition Rate Process Using Limited Optimized Reaction ALD”, Atomic Layer Deposition Conference”, Atomic Layer Deposition Conference, American Vacuum Society. pp. 1308-1311, 2004.